Exfoliated Monolayer on SiO2/Si (Select material)

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  • Exfoliated Monolayer on SiO2/Si
  • Exfoliated Monolayer on SiO2/Si
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Description

Monolayer flakes have been exfoliated from bulk crystals onto 90nm thermal oxide and measures from 5 micron up to 40 micron in size. Each sample contains at least one single-layer and is easy to find with the given x and y coordinates. Optical images and preliminary tests come with the product. Each sample is inspected under the optical microscope and x-y coordinates are recorded. Contact us for more information.

Characterization of Exfoliated Monolayers

Exfoliated MoS₂ Shows strong PL at 1.85-1.88 eV with 0.04 to 0.1eV FWHM. Typically, flakes show two prominent Raman peaks at 386cm-1 (E2g- in plane-) and 404cm-1 (A1g out-of-plane) and the FWHM (full-width-at-half-maximum) is less than 5cm-1.
Exfoliated WS₂ Typically, single-layer WS₂ show strong PL at 2.02eV with 0.04 to 0.08eV FWHM.
Exfoliated WSe₂ Typically, single-layer WSe₂ show strong PL at 1.66eV with 0.04 to 0.08eV FWHM, and the Raman peaks are located at 139.5cm-1 (E2g in-plane mode) and 249.5 cm-1 (A1g out-of-plane mode).
Exfoliated MoSe₂ Typically, single-layer MoSe₂ show strong PL at 1.55eV with 0.04 to 0.07eV FWHM, and the Raman peaks are located at 287.5cm-1 (E2g in-plane mode) and 241 cm-1 (A1g out-of-plane mode).

Possible applications:

  • Electronics
  • Sensors - detectors
  • Optics
  • STM - AFM applications
  • Molecular detection - binding
  • Ultra-low friction studies
  • Materials science and semiconductor research
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Additional Information

Elements:
Mo,S,Se,W
Element:
Molybdenum
Element:
Sulfur
Element:
Selenium
Element:
Tungsten
Formula:
MoS2, MoSe2, WS2, WSe2
Material class:
MX2
Material class:
Dichalcogen
Properties:
Semiconductor
Properties:
Excitonic
Band gap range:
VIS
Growth method:
Exfoliated
Doping:
Undoped
Thin-film type:
Monolayer
Substrate:
SiO2/Si
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