Description
We provide high-purity NbN (Niobium Nitride) thin films on SiO2/Si tailored for superconducting applications. These films are synthesized using pulsed laser deposition (PLD), ensuring precise stoichiometry and low defect densities. Product offers excellent uniformity and control over thickness.
Tc confirmed at 12K as per electrical resistivity measurements
Properties of NbN Thin Films
| Sample Size | Thin films (custom sizes available) |
|---|---|
| General property | Metallic / Superconducting Tc~12K |
| Crystal Structure | B1 cubic |
| Surface Roughness | <1 nm (RMS) |
| Production Method | Pulsed laser deposition (PLD) |
| Other Characteristics | Low defect density, high uniformity, oxidation-resistant |
Additional Information
Elements: |
Nb, N |
Element: |
Niobium |
Element: |
Nitrogen |
Formula: |
TiN |
Material Class: |
Nitrides |
Properties: |
Metal |
Properties: |
Superconductor |
Growth Method: |
Pulsed laser deposition |
Substrate: |
SiO2/Si |
